Shore Capital Reaffirms “Buy” Rating for Oxford Instruments (LON:OXIG)

Shore Capital reiterated their buy rating on shares of Oxford Instruments (LON:OXIG) in a research note released on Wednesday, Marketbeat.com reports.

Oxford Instruments Trading Up 2.7 %

Shares of OXIG opened at GBX 2,125 ($27.75) on Wednesday. The stock has a fifty day moving average of GBX 2,147.68 and a two-hundred day moving average of GBX 2,301.38. The company has a debt-to-equity ratio of 12.96, a quick ratio of 1.11 and a current ratio of 1.64. The company has a market capitalization of £1.23 billion, a PE ratio of 2,470.93, a price-to-earnings-growth ratio of -3.56 and a beta of 0.96. Oxford Instruments has a fifty-two week low of GBX 1,634 ($21.34) and a fifty-two week high of GBX 2,765 ($36.11).

Insider Transactions at Oxford Instruments

In other news, insider Gavin Hill sold 25,000 shares of the company’s stock in a transaction on Wednesday, August 7th. The stock was sold at an average price of GBX 2,274 ($29.69), for a total transaction of £568,500 ($742,360.93). In related news, insider Gavin Hill sold 25,000 shares of the stock in a transaction on Wednesday, August 7th. The stock was sold at an average price of GBX 2,274 ($29.69), for a total value of £568,500 ($742,360.93). Also, insider Richard Tyson purchased 5,821 shares of the stock in a transaction that occurred on Wednesday, July 24th. The stock was bought at an average price of GBX 2,420 ($31.60) per share, with a total value of £140,868.20 ($183,949.07). Insiders bought a total of 5,842 shares of company stock worth $14,132,971 in the last ninety days. Insiders own 4.98% of the company’s stock.

Oxford Instruments Company Profile

Oxford Instruments plc provide scientific technology products and services for academic and commercial organizations worldwide. It operates through three segments: Materials & Characterisation, Research & Discovery, and Service & Healthcare. The company offers atomic force, electron, and Raman microscopy; deposition tools comprising plasma enhanced chemical vapour deposition, chemical vapour deposition, inductively coupled plasma chemical vapour deposition, atomic layer deposition, and ion beam deposition systems; and etch tools, including inductively coupled plasma etching, reactive ion etching, deep silicon etching, atomic layer etching, and ion beam etching systems.