Oxford Instruments plc (LON:OXIG – Get Free Report) insider Gavin Hill purchased 7 shares of the stock in a transaction that occurred on Monday, November 11th. The stock was bought at an average price of GBX 2,122 ($27.31) per share, with a total value of £148.54 ($191.15).
Gavin Hill also recently made the following trade(s):
- On Thursday, October 10th, Gavin Hill acquired 7 shares of Oxford Instruments stock. The shares were bought at an average price of GBX 1,996 ($25.69) per share, for a total transaction of £139.72 ($179.80).
- On Tuesday, September 10th, Gavin Hill bought 7 shares of Oxford Instruments stock. The stock was bought at an average price of GBX 2,184 ($28.10) per share, with a total value of £152.88 ($196.73).
Oxford Instruments Stock Performance
Shares of OXIG stock opened at GBX 2,035 ($26.19) on Wednesday. The company has a debt-to-equity ratio of 12.96, a current ratio of 1.64 and a quick ratio of 1.11. The company’s fifty day moving average price is GBX 2,096.73 and its two-hundred day moving average price is GBX 2,308.02. The firm has a market capitalization of £1.18 billion, a P/E ratio of 2,366.28, a P/E/G ratio of -3.56 and a beta of 0.96. Oxford Instruments plc has a 12 month low of GBX 1,858 ($23.91) and a 12 month high of GBX 2,765 ($35.58).
Oxford Instruments Cuts Dividend
Wall Street Analysts Forecast Growth
Separately, Shore Capital reissued a “buy” rating on shares of Oxford Instruments in a research report on Wednesday, October 16th.
Check Out Our Latest Stock Report on Oxford Instruments
About Oxford Instruments
Oxford Instruments plc provide scientific technology products and services for academic and commercial organizations worldwide. It operates through three segments: Materials & Characterisation, Research & Discovery, and Service & Healthcare. The company offers atomic force, electron, and Raman microscopy; deposition tools comprising plasma enhanced chemical vapour deposition, chemical vapour deposition, inductively coupled plasma chemical vapour deposition, atomic layer deposition, and ion beam deposition systems; and etch tools, including inductively coupled plasma etching, reactive ion etching, deep silicon etching, atomic layer etching, and ion beam etching systems.
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